Ho Rarolla ho Sosobana ha Koporo ho Roll-to-Roll (R2R) Flexible Circuit Production
1. Motso Lisosa tsa ho Sosobana
Lintlha tsa bohlokoa tse bakang ho sosobana ha foil ea koporo mekhoeng ea R2R:
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Ho se leka-lekane ha tsitsipano: Khatello ea maikutlo sebakeng sa heno ka lebaka la likhahla tsa tsitsipano.
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CTE e sa lumellane: Copper (17 ppm/°C) vs. PI (35 ppm/°C) liphapano tsa katoloso.
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Mefokolo ea lirolara: Ho se tsamaisane hantle (> 0.01 mm/m) kapa ho silafala ha bokaholimo.
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Mefokolo ea Lamination: Mocheso o sa tloaelehang / khatello kapa phallo ea resin.
2. Maano a ho Laola
(1) Ts'ebetso ea Ts'ebetso ea Tension
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Taolo ea tsitsipano e koetsoeng:
Li-motor tsa servo + lisele tsa mojaro li boloka tsitsipano ka hare ho ± 0.1 N/mm. -
Khatello ea maikutlo:
Ho senyeha ha khatello ea maikutlo nakong ea ho khutlela morao (�=�0×(�0/�)�, n=0.8–1.2). -
Lirolara tse khahlanong le wrinkle:
Lirolara tse roaloang moqhaka (R=1500 mm bakeng sa bophara ba tepo ba limilimithara tse 500).
(2) Tsamaiso ea Thermal-Mechanical
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Taolo ea mocheso oa libaka:
5-8 libaka tse nang le ≤3 ° C gradient (preheat = 80 ° C, main = 180 ° C, pholile = 50 ° C). -
Ho tšoana ha khatello:
Li-silicone pads (Shore A 30–50) kapa litsamaiso tsa cushion tsa moea bakeng sa >95% e ts'oanang.
(3) Boenjiniere ba Lintho
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Koporo e bohlasoa bo tlase:
Foil e phekotsoeng ka morao (Rz=1–2 μm) e fokotsa khohlano. -
Substrate pretreatment:
Ar/O₂ plasma activation (500 W, 30 s) e phahamisa matla a holimo ho 50 mN/m. -
Ntlafatso ea sekhomaretsi:
Li-acrylics tsa phallo e phahameng (viscosity
(4) Tlhokomelo ea Lisebelisoa
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Tekanyo ea lirolara:
Ho lumellana ha laser beke le beke (± 0.001 mm) le ho hlahloba holim'a metsi (Ra -
Ho boloka tsamaiso ea koloi:
Linear guide lubrication le gear backlash adjustment (
3. Tlhokomelo ea Nako ea Sebele
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Tlhahlobo ea mahlo:
Lik'hamera tsa ho skena ka mela (5000fps) + li-algorithms tsa CNN li lemoha masoebe a 0.1 mm². -
Laser profilometry:
E lekanya ho bata ( -
Litšoantšo tse futhumetseng:
E hlokomela mocheso (± 2 ° C alamo moeling).
4. Ts'ebetso ea Parameters
Mohato oa Ts'ebetso | Key Parameter | Sepheo sa Range |
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Ho kokobetsa tsitsipano | Ho nepahala ha tsitsipano | ±0.05 N/mm |
Mocheso oa lamination. | Mocheso o moholo oa libaka | 180±2°C |
Khatello ea lamination | Khatello ea lihlopha | 2.5±0.1 MPa |
Taper coefficient | Tension decay exponent (n) | 0.9–1.0 |
Ho tsamaisana le rolara | Axial kheloha |
5. Lithuto Tsa Litaba
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Taba ea 1: 50μm PI + 12μm Cu foil
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Tharollo: Hasa lirolara + tsitsipano ea taper (n=0.95)
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Sephetho: Ho sosobana ho fokotsehile ho tloha ho 5% ho ea ho 0.3%, 20% ea lihlahisoa tse phahameng.
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Taba ea 2: Karolo e phahameng ea maqhubu a LCP
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Ts'ebetso ea plasma + lamination ea moea
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Sephetho: Phapang ea Dk
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